US Patent Issued to Tokyo Electron on Aug. 18 for "Plasma processing method and plasma processing system" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,856, issued on Aug. 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing method and plasma processing system" was invented by Tomohiko Niizeki (Tokyo), Maju Tomura (Miyagi, Japan) and Yoshihide Kihara (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma processing method performed with a plasma processing apparatus including a chamber. The method includes: (a) providing a substrate in the chamber, the substrate having an organic film and a mask on the organic film, the mask including a silicon-containing film and a carbon-containing film on the silicon-containing film; and (b) forming a plasma from a proc...