ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,586, issued on April 7, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus and matching method" was invented by Sho Sato (Miyagi, Japan) and Ken Yoshida (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a chamber in which a plasma processing is performed, an electrode that supplies a radio-frequency power to the chamber for the plasma processing; a radio-frequency power supply electrically connected to the electrode, and a matching device connected between the radio-frequency power supply and the electrode. The radio-frequency power supply supplies one of a modulated wave and ...