US Patent Issued to Tokyo Electron on April 21 for "Shower head, substrate processing apparatus, and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,911, issued on April 21, was assigned to Tokyo Electron Ltd. (Tokyo).

"Shower head, substrate processing apparatus, and substrate processing method" was invented by Hideki Nagaoka (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A shower head includes a first diffusion chamber spreading inside a structure in a direction perpendicular to a thickness direction to diffuse a first gas, a second diffusion chamber provided independent of and adjacent to the first diffusion chamber in the thickness direction of the structure to diffuse a second gas, cylinders disposed in the first diffusion chamber and having holes communicating with the s...