US Patent Issued to Tokyo Electron on April 14 for "Substrate processing system and state monitoring method" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,698, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and state monitoring method" was invented by Toshiaki Kodama (Nirasaki City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a substrate processing apparatus configured to process a substrate, a substrate transfer mechanism including a substrate holder configured to hold the substrate, an imaging device provided in the substrate transfer mechanism and configured to image a monitoring target member inside the substrate processing apparatus, and a controller. The controller is configured to cause the imaging d...