US Patent Issued to Tokyo Electron, The University of Shiga Prefecture on July 21 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,004, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo) and The University of Shiga Prefecture (Shiga, Japan).

"Plasma processing apparatus" was invented by Kazushi Kaneko (Yamanashi, Japan) and Osamu Sakai (Shiga, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus comprises a processing chamber having a processing space, an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation to be supplied to the processing space, a dielectric having a first surface facing the processing space, an electromagnetic wave supply configured to supply the electromagnetic waves to th...