US Patent Issued to Tokyo Electron, CKD on Aug. 25 for "Automatic pressure control device, film forming apparatus and pressure control method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,520, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo) and CKD Corp. (Aichi, Japan).

"Automatic pressure control device, film forming apparatus and pressure control method" was invented by Satoshi Yonekura (Tokyo), Tamaki Takeyama (Yamanashi, Japan), Tatsuhiko Tanimura (Yamanashi, Japan), Shigeyuki Okura (Yamanashi, Japan) and Yasunori Nishimura (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An automatic pressure control device that controls a pressure in a processing container to which a source gas for forming a film on a substrate is supplied, includes: a vacuum exhauster configured to vacuum-exhaust a gas in the pro...