ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,045, issued on March 24, was assigned to Tokai Optical Co. Ltd. (Okazaki, Japan).
"Optical thin film manufacturing method and optical thin film" was invented by Keiji Nishimoto (Okazaki, Japan) and Chiaki Inoue (Okazaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing an optical thin film having a first thin film portion and a second thin film portion, on a film formation surface of a base member directly or via an intermediate film. The method comprising forming the first thin film portion on a first film formation portion of the film formation surface; forming a washing-time removal film on the first thin film port...