US Patent Issued to THE UNIVERSITY OF CHICAGO on June 30 for "Rare-earth ion doped thin film technologies" (Illinois Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,889, issued on June 30, was assigned to THE UNIVERSITY OF CHICAGO (Chicago).

"Rare-earth ion doped thin film technologies" was invented by Manish Singh (Chicago), Tian Zhong (Chicago) and Supratik Guha (Chicago).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure includes a thin film assembly comprising a substrate and an epitaxial crystalline thin film disposed on the substrate, wherein the epitaxial crystalline thin film is a single crystal, wherein at least a portion of the epitaxial crystalline thin film is doped with rare-earth ions at a concentration of less than 100 parts per billion. The disclosure further includes a method ...