ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,480, issued on Oct. 6, was assigned to The Regents of the University of California (Oakland, Calif.).

"UV lithography system and method" was invented by Alexander Groisman (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photolithography system includes an optical assembly for delivering a collimated light beam with spatially uniform light across the beam to a substrate on a substrate mount. A multi-axis support assembly provides for angular and rotational control of relative positioning of the optical assembly and the substrate mount to allow fabrication of microfeatures with different draft angles."

The patent was filed on March 31, 202...