US Patent Issued to The Procter & Gamble on Sept. 15 for "Patterned apertured nonwoven" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,079, issued on Sept. 15, was assigned to The Procter & Gamble Co. (Cincinnati).

"Patterned apertured nonwoven" was invented by Sijia Wang (Beijing), Fancheng Wang (Beijing), Yuhan Wang (Beijing), Meng Chen (Beijing) and Xiaoxin Liu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a nonwoven substrate comprising a plurality of apertures that form a pattern and define a plurality of discrete non-aperture zones. Each of the plurality of discrete non-aperture zones has a periphery formed by a continuous line of apertures, with adjacent apertures being spaced apart by an edge-to-edge distance of no more than 3 mm...