US Patent Issued to The Hong Kong Research Institute of Textiles and Apparel on June 30 for "Treatment method for indigo-containing wastewater by combined adsorption and regeneration process" (Chinese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,512, issued on June 30, was assigned to The Hong Kong Research Institute of Textiles and Apparel Ltd. (Kowloon, Hong Kong).

"Treatment method for indigo-containing wastewater by combined adsorption and regeneration process" was invented by Alex Chan (Kowloon, Hong Kong), Ray Chun Wai Cheung (Kowloon, Hong Kong), Lik Ki Mui (Kowloon, Hong Kong) and Hau To Wong (Kowloon, Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrative approach combines a process of adsorption and ozonation which are used for removing the indigo dye from textile wastewater and the regeneration of adsorbent materials. Metal oxide modified adsorbents are efficient...