US Patent Issued to The Hong Kong Polytechnic University on Nov. 3 for "Air-conditioned facemask" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,252, issued on Nov. 3, was assigned to The Hong Kong Polytechnic University (Hong Kong).

"Air-conditioned facemask" was invented by Dahua Shou (Hong Kong), Guanghan Huang (Hong Kong), Jintu Fan (Hong Kong) and Wing Sze Suen (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a facemask (100), atmospheric air is filtered by a disposable surgical mask (180) to form respirable air. The facemask (100) has a frame (150) formed with an interior cavity (151) for storing the respirable air to be breathed by the user. A thermoregulation unit (110) mounted to the frame (150) provides air conditioning to the respirable air by using a fan (421) to draw ...