ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,100, issued on March 17, was assigned to THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (Urbana, Ill.).
"Method of liquid-mediated pattern transfer and device structure formed by liquid-mediated pattern transfer" was invented by Seok Kim (Pohang-si, South Korea) and Jun Kyu Park (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of liquid-mediated pattern transfer includes providing a substrate comprising (a) a semiconductor film adhered to the substrate and (b) a first patterned layer on the semiconductor film. The substrate is submerged in a delamination liquid, whereby the semiconductor film is delaminated from the subs...