ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,251, issued on April 14, was assigned to TES Co. LTD (Yongin-si, South Korea).
"Hybrid chamber" was invented by Jae-Woo Kim (Seongnam-si, South Korea) and Sang-Woo Cho (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a hybrid chamber, and more specifically, to a hybrid chamber capable of performing both a gas phase etching (GPE) process for removing oxide from a substrate and a radical dry cleaning (RDC) process for removing nitride from the substrate in one chamber."
The patent was filed on April 4, 2023, under Application No. 18/130,429.
*For further information, including images, charts and...