US Patent Issued to TEKSCEND PHOTOMASK on Sept. 22 for "Reflective mask blank, reflective mask, reflective mask manufacturing method, and reflective mask correction method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,016, issued on Sept. 22, was assigned to TEKSCEND PHOTOMASK CORP. (Tokyo).

"Reflective mask blank, reflective mask, reflective mask manufacturing method, and reflective mask correction method" was invented by Kazuaki Matsui (Tokyo) and Yosuke Kojima (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided a reflective mask blank, a reflective mask, a reflective mask manufacturing method, and a reflective mask correction technique capable of reducing time required for electron beam correction etching, even when a material used for a thin absorption film has a large extinction coefficient k to an EUV light. A reflective photomask blan...