US Patent Issued to TEKSCEND PHOTOMASK on Oct. 27 for "Reflective photomask blank and reflective photomask" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,206, issued on Oct. 27, was assigned to TEKSCEND PHOTOMASK CORP. (Tokyo).

"Reflective photomask blank and reflective photomask" was invented by Ayumi Goda (Tokyo), Yuto Yamagata (Tokyo), Hideaki Nakano (Tokyo) and Kenjiro Ichikawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is intended to provide a reflective photomask blank and a reflective photomask that have high hydrogen radical resistance and minimize a shadowing effect to improve transferability. A reflective photomask blank (10) according to the present embodiment includes a substrate (1), a reflective portion (7), and a low reflective portion (8). The low refl...