US Patent Issued to TDK on Sept. 8 for "Distortion resistance film and pressure sensor" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,023, issued on Sept. 8, was assigned to TDK Corp. (Tokyo).

"Distortion resistance film and pressure sensor" was invented by Kohei Nawaoka (Tokyo), Ken Unno (Tokyo), Tetsuya Sasahara (Tokyo) and Masanori Kobayashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A distortion resistance film is capable of reducing a property change accompanying a composition change and a pressure sensor uses the distortion resistance film. The distortion resistance film is represented by a formula Cr100-x-yAlxNy, in which composition regions of x and y satisfy 25greater thanxless than equal to50 and 0.1greater thanyless than equal to20, respectively."

The patent...