ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,492, issued on May 19, was assigned to TDK Corp. (Tokyo).
"Electromagnetic wave sensor and manufacturing method thereof" was invented by Naoki Ohta (Tokyo), Shinji Hara (Tokyo), Susumu Aoki (Tokyo), Maiko Kokubo (Tokyo), Kazuya Maekawa (Tokyo) and Tadao Senriuchi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Electromagnetic wave sensor (infrared sensor) has a first substrate; a second substrate that faces the first substrate and that allows infrared rays to pass through at least a part of the second substrate; first circumferential wall that is positioned between the first substrate and the second substrate and that forms first space together...