US Patent Issued to TDK on Aug. 4 for "Thin-film capacitor with protective insulating films embedding capacitor electrodes" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,547, issued on Aug. 4, was assigned to TDK Corp. (Tokyo).

"Thin-film capacitor with protective insulating films embedding capacitor electrodes" was invented by Hitoshi Saita (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A thin film capacitor 1 includes a dielectric layer, capacitor electrodes formed respectively on first and second surfaces of the dielectric layer, a protective insulating film formed on the first surface of the dielectric layer so as to embed therein one of the capacitor electrodes, a protective insulating film formed on the second surface of the dielectric layer so as to embed therein the other of the capacitor electrodes, a...