US Patent Issued to TASMIT on Feb. 17 for "Pattern defect detection method" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,555,220, issued on Feb. 17, was assigned to TASMIT INC. (Yokohama, Japan).

"Pattern defect detection method" was invented by Kotaro Maruyama (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This method includes: generating a backscattered-electron image of a multilayered structure (400) including a plurality of patterns formed in a plurality of layers by a scanning electron microscope (50); classifying a plurality of regions of a virtual multilayered structure (300) including a CAD pattern created from design data of the plurality of patterns into a plurality of groups according to CAD pattern arrays in a depth direction of the virtual mu...