US Patent Issued to TANAKA PRECIOUS METAL TECHNOLOGIES on July 7 for "Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,673,965, issued on July 7, was assigned to TANAKA PRECIOUS METAL TECHNOLOGIES Co. Ltd. (Tokyo).

"Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition" was invented by Ryosuke Harada (Tsukuba, Japan), Tomohiro Tsugawa (Tsukuba, Japan), Shigeyuki Ootake (Tsukuba, Japan), Seung-Joon Lee (Tsukuba, Japan) and Yohei Kotsugi (Tsukuba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to an organoruthenium compound raw material for a chemical deposition method. An organoruthenium compound is represented by the following Formula 1 in...