ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,241, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).
"Common rail contact" was invented by Cheng-Wei Chang (Hsinchu, Taiwan), Hong-Ming Wu (Hsinchu, Taiwan), Chen-Yuan Kao (Hsinchu County, Taiwan), Li-Hsiang Chao (New Taipei City, Taiwan) and Yi-Ying Liu (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method according to the present disclosure includes receiving a workpiece including a gate structure, a first source/drain (S/D) feature, a second S/D feature, a first dielectric layer over the gate structure, the first S/D feature, the second S/D feature, a first S/D contact over...