US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 1 for "Integrated circuit with pattern overlay for assisting overlay signal and accuracy" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,187, issued on Sept. 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Integrated circuit with pattern overlay for assisting overlay signal and accuracy" was invented by Pei-Sheng Tang (Hsinchu, Taiwan), Chen-Yen Kao (Hsinchu, Taiwan) and Jheng-Syun Yang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit includes a device region and an overlay mark region. The device region includes a plurality of stacked channels of a transistor, a source/drain region of the transistor, a source/drain contact of a first material on the source/drain region, and a conductive via of a second material ...