US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 1 for "Dual ampoule separator plate and method" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,311, issued on Sept. 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Dual ampoule separator plate and method" was invented by Chi-Wen Chiu (Hsinchu, Taiwan), Chih-Chang Wu (Hsinchu City, Taiwan), Che-Wei Tung (Hsinchu, Taiwan), Chiang Hsien Shih (Hsinchu, Taiwan) and Chin-Szu Lee (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method for reducing thermal transfer in a dual ampoule system. The dual ampoule system includes a first ampoule, a second ampoule, and a planar heat shield. The planar heat shield is positioned between the first ampoule and the second ampoule, where the plana...