ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,752,394, issued on Oct. 6, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for real time inline mixing CMP slurry" was invented by Yi-Chieh Hsieh (Hsinchu, Taiwan), Ming-Hsiang Cheng (Hsinchu, Taiwan), Ting-Kui Chang (Hsinchu, Taiwan) and William Weilun Hong (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inline CMP slurry mixing system includes a mixing device having a container and a blender, a removal rate sensor disposed adjacent to a CMP platen, a signal processor, and a process controller. The container is in fluid connection to a base slurry supply and additive supplies. The blen...