US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 3 for "STI loss mitigation by radical oxidation treatment" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,399, issued on Nov. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"STI loss mitigation by radical oxidation treatment" was invented by Shao-Hua Hsu (Taitung, Taiwan), Chia-I Lin (Taipei, Taiwan), Hsiu-Hao Tsao (Taichung, Taiwan), Kai-Min Chien (New Taipei, Taiwan), Chen-Huang Huang (Hsinchu, Taiwan), An Chyi Wei (Hsinchu, Taiwan) and Ryan Chia-Jen Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments include a method and device resulting from the method, including using a radical oxidation process to oxidize a spacer layer which lines the opening after removing a dummy gate electrode. The...