US Patent Issued to Taiwan Semiconductor Manufacturing on May 5 for "VCSEL with self-aligned microlens to improve beam divergence" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,779, issued on May 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"VCSEL with self-aligned microlens to improve beam divergence" was invented by Jhih-Bin Chen (Hsinchu, Taiwan) and Ming Chyi Liu (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of making a microlens for a VCSEL device includes forming a first lens layer over a second reflector layer. The first lens layer has a first average concentration of a first element. A first additional reflector layer is formed over the first lens layer. A second lens layer is formed over the first additional reflector layer. The second lens layer h...