US Patent Issued to Taiwan Semiconductor Manufacturing on May 5 for "Focus ring for a plasma-based semiconductor processing tool" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,562, issued on May 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Focus ring for a plasma-based semiconductor processing tool" was invented by Sheng-Chieh Huang (Hsinchu, Taiwan), Chang Kuang Tso (Hsinchu, Taiwan), Chou Feng Lee (Hsinchu County, Taiwan), Chung-Hsiu Cheng (Banqiao, Taiwan), Jr-Sheng Chen (Hsinchu, Taiwan), Chun Yan Chen (Zhubei, Taiwan), Chih-Hsien Hsu (Hsinchu, Taiwan) and Chin-Tai Hung (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focus ring for a plasma-based semiconductor processing tool is designed to provide and/or ensure etch rate uniformity across a wafer during a plasma e...