US Patent Issued to Taiwan Semiconductor Manufacturing on May 19 for "Systems and methods for determining residual compounds in plasma process" (Taiwanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,454, issued on May 19, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Systems and methods for determining residual compounds in plasma process" was invented by Chen-Tai Chen (Hsinchu, Taiwan), Jing-Ran Lin (Hsinchu, Taiwan), Jer-Shien Yang (Hsinchu, Taiwan), Hung-Wen Chen (Hsinchu, Taiwan), I-Ling Kuo (Hsinchu, Taiwan) and Yu-Hsun Chiang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a system and method for predicting wafer fabrication defects resulting from plasma processing of wafers in a plasma processing chamber. The system and method include processing electromagne...