US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 12 for "Semiconductor process chamber with improved reflector" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,447, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Semiconductor process chamber with improved reflector" was invented by Sou-Chuan Chiang (Hsinchu, Taiwan), Chia Hung Liu (Hsinchu, Taiwan) and Yen Chuang (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing chamber for performing an epitaxial deposition process is provided. The chamber includes a substrate support having an upper surface, a reflector disposed above the substrate support. The reflector includes a body comprising an upper opening having a first diameter, a bottom opening having a second diameter le...