US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 12 for "Lithography scanner throughput" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,434, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Lithography scanner throughput" was invented by Kai-Chieh Chang (Changhua, Taiwan), Che-Chang Hsu (Taichung, Taiwan), Kai-Fa Ho (New Taipei, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for optimizing scan speed of a lithography scanner. A process design layout corresponding to a plurality of rows of fields to be formed on an associated wafer is received and a default machine constant of the lithography scanner is determined. Each of the plurality of rows is then identified correspon...