US Patent Issued to Taiwan Semiconductor Manufacturing on March 31 for "Lithography contamination control" (Taiwanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,182, issued on March 31, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Lithography contamination control" was invented by Chieh Hsieh (Hsinchu, Taiwan), Tai-Yu Chen (Hsinchu, Taiwan), Cho-Ying Lin (Hsinchu, Taiwan), Heng-Hsin Liu (Hsinchu, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Shang-Chieh Chien (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light...