US Patent Issued to Taiwan Semiconductor Manufacturing on March 31 for "Contamination handling for semiconductor apparatus" (Taiwanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,181, issued on March 31, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Contamination handling for semiconductor apparatus" was invented by Fu-Chun Hsieh (Hsinchu, Taiwan), Chih-Che Lin (Jhubei City, Taiwan) and Pei-Yi Su (Taichung City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure describes a lithography apparatus comprising a photoresist coating unit configured to perform one or more coating processes on a substrate. The lithography apparatus further comprises a detection unit configured to determine a contamination level of a contaminant from the one or more coating processes adher...