ALEXANDRIA, Va., March 3 -- United States Patent no. 12,568,664, issued on March 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor device and method of manufacturing thereof" was invented by Min-Hsuan Lu (Hsinchu City, Taiwan), Kan-Ju Lin (Kaohsiung City, Taiwan), Lin-Yu Huang (Hsinchu, Taiwan), Sheng-Tsung Wang (Hsinchu, Taiwan), Huan-Chieh Su (Changhua County, Taiwan) and Chih-Hao Wang (Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device and a method of manufacturing thereof are provided. The semiconductor device comprises a gate stack, source/drain regions, and a source/drain contact via. The gate stack is disposed on ...