US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 3 for "Method for mask data synthesis with wafer target adjustment" (Taiwanese Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,384, issued on March 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method for mask data synthesis with wafer target adjustment" was invented by Hsu-Ting Huang (Hsinchu, Taiwan), Tung-Chin Wu (Hsinchu, Taiwan), Shih-Hsiang Lo (Hsinchu, Taiwan), Chih-Ming Lai (Hsinchu, Taiwan), Jue-Chin Yu (Taichung, Taiwan), Ru-Gun Liu (Zhubei, Taiwan) and Chin-Hsiang Lin (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a correc...