ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,488, issued on March 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Integrated circuit structure" was invented by Te-Hsin Chiu (Miaoli County, Taiwan), Shih-Wei Peng (Hsinchu, Taiwan), Wei-Cheng Lin (Taichung, Taiwan) and Jiann-Tyng Tzeng (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit structure is provided, including a gate, a first conductive line and a pair of second conductive lines, and a first feed-through via. The gate is disposed on a front side of the integrated circuit structure and extends in a first direction on a first side of a dielectric layer. The first c...