ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,668, issued on June 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor devices with bonding layers" was invented by Wan Chen Hsieh (Hsinchu City, Taiwan) and Zhen-Cheng Wu (Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes the following steps. A transistor including a first gate structure is formed on a first substrate. A first dielectric layer is deposited over the transistor using plasma enhanced atomic layer deposition (PEALD). A multilayer stack is formed on a second substrate. The multilayer stack comprises alternately stacked semiconductor layers and sacri...