US Patent Issued to Taiwan Semiconductor Manufacturing on June 2 for "Focus ring for a plasma-based semiconductor processing tool" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,690, issued on June 2, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Focus ring for a plasma-based semiconductor processing tool" was invented by Sheng Chieh Huang (Hsinchu, Taiwan), Cheng Kuang Tso (Hsinchu, Taiwan), Chou-Feng Lee (Hsinchu County, Taiwan), Chung-Hsiu Cheng (Banqiao City, Taiwan), Jr-Sheng Chen (Hsinchu City, Taiwan), Chun Yan Chen (Zhubei City, Taiwan), Chih-Hsien Hsu (Hsinchu City, Taiwan) and Chin-Tai Hung (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focus ring for a plasma-based semiconductor processing tool is designed to provide and/or ensure etch rate uniformity across a w...