ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,296, issued on June 16, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor device and method" was invented by Tsai-Yu Huang (Taoyuan City, Taiwan), Han-De Chen (Hsinchu, Taiwan), Huicheng Chang (Tainan City, Taiwan) and Yee-Chia Yeo (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In an embodiment, a device includes: a first semiconductor strip over a substrate, the first semiconductor strip including a first channel region; a second semiconductor strip over the substrate, the second semiconductor strip including a second channel region; a dielectric strip disposed between the first semicondu...