US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 28 for "Method and apparatus for controlling droplet in extreme ultraviolet light source" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,599, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Method and apparatus for controlling droplet in extreme ultraviolet light source" was invented by Chi-Hung Liao (New Taipei City, Taiwan) and Yueh-Lin Yang (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography method in semiconductor fabrication is provided. The method includes generating a plurality of first drops of a target material through a first nozzle group selected from a plurality of nozzles to form a first elongated droplet; generating a first laser pulse to convert the first elongated droplet into plasma that...