US Patent Issued to Taiwan Semiconductor Manufacturing on July 21 for "Lithography system and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,785, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Lithography system and methods" was invented by Ming-Hsin Chen (Hsinchu, Taiwan), Tzi-Wen Chen (Hsinchu, Taiwan), Chi Yang (Hsinchu, Taiwan), Yao-Tang Lin (Hsinchu, Taiwan) and Jian-Yuan Su (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: protecting a mask of a mask assembly by a frame thereon during translating the mask assembly to a position associated with a region of a substrate, the frame having height less than a focal plane associated with a selected particle size; directing extreme ultraviolet (EUV) radiat...