ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,112, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Ion generators of ion implanters with movable repeller" was invented by Ying-Chieh Meng (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion generator of an ion implanter is provided. The ion generator includes: an arc chamber defined by an arc chamber housing extending in a traveling direction; a filament configured to generate thermal electrons; a cathode disposed at a first end of the arc chamber housing in the traveling direction and configured to generate secondary electrons in response to bombardment of the thermal electro...