ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,162, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"CVD device pumping liner" was invented by Sheng-chun Yang (Hsinchu, Taiwan), Yi-Ming Lin (Hsinchu, Taiwan), Chih-tsung Lee (Hsinchu, Taiwan), Yun-Tzu Chiu (Hsinchu, Taiwan) and Chao-Hung Wan (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with w...