ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,829, issued on Feb. 24, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Photonic semiconductor device and method" was invented by Chih-Hsin Lu (Tainan, Taiwan), Chin-Her Chien (Chung-Li, Taiwan), Chung-Hao Tsai (Huatan Township, Taiwan), Chuei-Tang Wang (Taichung, Taiwan) and Chen-Hua Yu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a first waveguide over a substrate; forming a first layer of low-dimensional material on the first waveguide; forming a first layer of dielectric material over the first layer of low-dimensional material; forming a second layer of low dimensional...