US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Feb. 17 for "Pellicle membrane and method of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,191, issued on Feb. 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Pellicle membrane and method of forming the same" was invented by Wei-Hao Lee (Taipei, Taiwan), Pei-Cheng Hsu (Taipei, Taiwan), Huan-Ling Lee (Hsinchu County, Taiwan) and Hsin-Chang Lee (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a pellicle includes forming a protective film surrounding a membrane to form a pellicle membrane using a plasma enhanced atomic layer deposition (PEALD) process, in which the membrane includes a network of carbon nanotubes, the PEALD process is performed by a plurality of...