ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,657, issued on Aug. 11, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Thin film resistor" was invented by Chun-Heng Chen (Hsinchu City, Taiwan), Chi-Yuan Shih (Hsinchu, Taiwan), Hsin-Li Cheng (Hsinchu, Taiwan), Shih-Fen Huang (Zhubei, Taiwan), Tuo-Hsin Chien (Hsinchu County, Taiwan) and Yu-Chi Chang (Kaohsiung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Resistors and method of forming the same are provided. A device structure according to the present disclosure includes a substrate, a first intermetal dielectric (IMD) layer over the substrate, a resistor that includes a first resistor layer over the f...