US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 11 for "Method and system for reducing layout distortion due to exposure non-uniformity" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,705,413, issued on Aug. 11, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and system for reducing layout distortion due to exposure non-uniformity" was invented by Chi-Ta Lu (Yilan County, Taiwan), Chia-Hui Liao (Hsinchu, Taiwan), Yihung Lin (Hsinchu County, Taiwan) and Chi-Ming Tsai (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: receiving a design layout comprising a feature extending in a peripheral region and a central region of the design layout; determining compensation values associated with a pellicle assembly and the peripheral region according to an exposure distrib...