US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 7 for "Method and apparatus for reducing solvent consumption" (Taiwanese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,571, issued on April 7, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and apparatus for reducing solvent consumption" was invented by Chun-Wei Liao (Taoyuan, Taiwan), Tung-Hung Feng (Hsinchu, Taiwan), Hui-Chun Lee (Hsinchu, Taiwan) and Shih-Che Wang (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A solution dispense system for a semiconductor manufacturing process includes a longer circulation loop in order to minimize the idle section from resist pump to dispense nozzle. A t-valve and control valve are disposed close to the nozzle in order to decrease the idle section and reduce mate...