ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,720, issued on Feb. 24, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC NANJING COMPANY Ltd. (Nanjing, China).
"Method of forming semiconductor device including daisy-chained delay cells" was invented by Huaixin Xian (Hsinchu, Taiwan), Longbiao Lei (Hsinchu, Taiwan), Senpei Goa (Hsinchu, Taiwan), Zhang-Ying Yan (Hsinchu, Taiwan), Qingchao Meng (Hsinchu, Taiwan) and Jerry Chang Jui Kao (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a semiconductor device includes forming a first row of transistors extending in a first direction and including dummy transistors and active t...