ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,173, issued on May 19, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and NATIONAL TSING HUA UNIVERSITY (Hsinchu City, Taiwan).
"Semiconductor device and manufacturing method thereof" was invented by Ya-Chin King (Hsinchu, Taiwan), Chrong Jung Lin (Hsinchu, Taiwan), Burn Jeng Lin (Hsinchu, Taiwan), Yao-Hung Huang (Hsinchu, Taiwan) and Wei Chang (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a sensing element including a sensing electrode and a filter covering the sensing electrode. The filter includes a first work function layer and a second work function layer. Th...